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A description of the design principles, seen mainly from the fabrication point of view. Following a review of the historical development and of the materials used in lasing at short to long wavelengths, the book goes on to discuss the basic design principles for semiconductor-laser devices and the epitaxy for laser production. One entire chapter is devoted to the technology of liquid-phase epitaxy, while another treats vapor-phase and beam epitaxies. The whole is rounded off with mode-control techniques and an introduction to surface-emitting lasers.Process Technology for Semiconductor Lasers describes the design principles of semiconductor lasers, mainly from the fabrication point of view. A review is given of the history of semiconductor-laser development and applications and of the materials used in lasing at short to long wavelengths. The basic design principles for semiconductor-laser devices and the epitaxy for laser production are discussed. An entire chapter is devoted to the technology of liquid-phase epitaxy, and another one to vapor-phase and beam epitaxies. The characterizations of laser materials and the fabrication and characteristics of semiconductor lasers are treated. Mode-control techniques are presented, and surface-emitting lasers are introduced in the final chapter.1. Introduction.- 1.1 Outline of Semiconductor Laser Theory.- 1.2 Semiconductor Lasers in Opto-electronics.- 1.3 Necessary Technology for Semiconductor Lasers.- 1.4 Brief History of Semiconductor Lasers.- 1.5 Typical Semiconductor Lasers.- 2. Materials for Semiconductor Lasers.- 2.1 III-V Compound Semiconductors.- 2.1.1 Band Structure of III-V Semiconductors.- 2.1.2 Other Characteristics of III-V Compound Semiconductors.- 2.2 Crystals for Visible to Near-Infrared-Wavelength Emission Semiconductor Lasers.- 2.2.1 Importance of Visible to Near-Infrared-Wavelenth Laser Emission.- 2.2.2 Crystal Materials for the Near-Infrared Region.- 2.2.3 Crystal Materials for Visible l3.
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